谢谢！
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Diffractive-Refractive Hybrid
Microscope Objective for 193 nm Inspection Systems; Proc. SPIE Vol. 5177 (2003)9–15
R. Brunner, A. Menck, R. Steiner, G. Buchda, S. Weissenberg, U. Horn, and
A.M. Zibold, Immersion Mask Inspection with Hybrid-Microscopic Systems at 193 nm;
Proc. SPIE Vol. 5567 (2004) 887–893
T. Sure, J. Heil, and J. Wesner, Microscope objective production: On the
way
from the micrometer scale to the nanometer scale, Proc. SPIE Vol. 5180 (2003)283–292
beiyangkl@tju.edu.cn
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本帖最后由 beiyangkl 于 2008-4-21 16:02 编辑 ]
